Multipurpose Chamberвђ вђ Tem Sem Sample Cleaning Storage Solution

tem And sem sample cleaning And storage chamber Plasma cleane
tem And sem sample cleaning And storage chamber Plasma cleane

Tem And Sem Sample Cleaning And Storage Chamber Plasma Cleane High vacuum tem specimen holder storage, leak check, and plasma cleaning chamber. the tem cube chamber can be used to store up to eight tem specimen holders under a high vacuum (ultimate vacuum in the mid 10 7 torr range). the vacuum level is high enough for leaking check of the in situ tem chips. it can also be fitted with a remote em kleen. They all think our tergeo em plasma system and vacuum storage system are much easier to use and are very versatile. tergeo em plasma cleaner can be used to remove hydrocarbon contaminations on tem and sem samples. it can accept two tem specimen holders at the same time. the front adapter can be easily replaced to support more than two different.

multipurpose chamberвђ вђ tem sem sample cleaning storage
multipurpose chamberвђ вђ tem sem sample cleaning storage

Multipurpose Chamberвђ вђ Tem Sem Sample Cleaning Storage Tabletop plasma cleaner for tem, sem sample, and specimen holder cleaning. tabletop tergeo em plasma cleaner can accept two tem specimen holders. its chamber is big enough for two 4″ wafers. users can also insert tem, sem samples,s or grids directly into the plasma chamber. removing hydrocarbon contamination on tem and sem samples before imaging. Multipurpose chamber——tem & sem sample cleaning & storage solution. the multipurpose chamber can be configured for different applications with exter nal accessories such as em kleen remote plasma source and or tem specimen holder adapters. em kleen remote plasma source can be used to generate oxygen & hydrogen radicals using air, o2, or h2. Sem chamber plasma cleaning system {loadposition shop menu pos 1} overview rave scientific offers the ibss gv10x plasma cleaning system to mitigate chamber and sample hydrocarbon contamination. the gv10x has been integrated on jeol, hitachi, fei, zeiss and tescan electron microscope chambers. the gv10x downstream asher’s ability to remove carbon contamination is a quantum leap beyond the. Electron microscopy applications. this downstream plasma asher system can be used as an in situ cleaner for scanning electron microscope (sem) and focused ion beam (fib) microscope chambers or can be customized into a portable system for tem sample cleaning. in this work, we report the results of a systematic evaluation of the gv10x.

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